magnetron-sputtered film

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• High Power Impulse Magnetron Sputtering — (HIPIMS, also known as High Impact Power Magnetron Sputtering and High Power Pulsed Magnetron Sputtering, HPPMS) is a method for physical vapor deposition of thin films which is based on magnetron sputter deposition. HIPIMS utilises extremely… …   Wikipedia

• Нанопокрытия — покрытия толщиной от 1 до 100 нм[1]. В зависимости от вещества обладают следующими свойствами: Al2O3 Гидрофобность Ti и Ni износостойкость режущего инструмента (наносятся методом PVD) Cu используется в лазерной технике из за высокой отражающей… …   Википедия

• Sputter deposition — is a physical vapor deposition (PVD) method of depositing thin films by sputtering, that is ejecting, material from a target, that is source, which then deposits onto a substrate, such as a silicon wafer. Resputtering is re emission of the… …   Wikipedia

• Sputtering — is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic ions. It is commonly used for thin film deposition, etching and analytical techniques (see below). Physics of sputtering Physical… …   Wikipedia

• Pulsed laser deposition — (PLD) is a thin film deposition (specifically a physical vapor deposition, PVD) technique where a high power pulsed laser beam is focused inside a vacuum chamber to strike a target of the desired composition. Material is then vaporized from the… …   Wikipedia

• Hard disk platter — A hard disk platter (or disk) is a component of a hard disk drive: it is the circular disk on which the magnetic data are stored. The rigid nature of the platters in a hard drive is what gives them their name (as opposed to the flexible materials …   Wikipedia

• Hard-disk platter — Hard disk with platter A hard disk platter (or disk) is a component of a hard disk drive: it is the circular disk on which the magnetic data is stored. The rigid nature of the platters in a hard drive is what gives them their name (as opposed to… …   Wikipedia